Adhesion and delamination of tantalum and chromium films on glass
| Autor: | Norbert J. Binkowski, Lyle D. Kinney, Emmanuel C. Onyiriuka |
|---|---|
| Rok vydání: | 1997 |
| Předmět: |
Suboxide
Materials science Delamination Analytical chemistry Tantalum chemistry.chemical_element Surfaces and Interfaces General Chemistry Sputter deposition Surfaces Coatings and Films Secondary ion mass spectrometry chemistry X-ray photoelectron spectroscopy Mechanics of Materials Materials Chemistry Composite material Thin film Layer (electronics) |
| Zdroj: | Journal of Adhesion Science and Technology. 11:929-940 |
| ISSN: | 1568-5616 0169-4243 |
| DOI: | 10.1163/156856197x00507 |
| Popis: | The adhesion and delamination behavior of sputtered Ta and Cr films on barium boroaluminosilicate glass were investigated. The locus of delamination was determined by XPS analysis of peeled film strips to be at the film-glass interface. We found a strong correlation between the intensity and thickness of the metal suboxide interphase layer formed and resistance to film delamination. For Ta, we found that the presence of a sufficiently thick TaOx layer at the glass-film interface effectively prevented debonding of the film from the glass substrate. The role of oxygen in metal-glass bonding chemistry was explored by sputter deposition of metal films with in situ oxygen or air dosing. SIMS sputter-depth composition profiles confirmed the presence of a Ta-oxide phase (20-90 nm, depending on the dosing conditions) at the film-glass interface. We found that the delamination mechanism was prevented by in situ oxygen doping of the glass surface during film deposition. The cleanliness of the glass surface prior to... |
| Databáze: | OpenAIRE |
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