Features of the structure formation of PZT thin films by reactive plasma sputtering
| Autor: | V. V. Petrov, A. V. Nesterenko, Yu. N. Varzarev, I. N. Kots |
|---|---|
| Rok vydání: | 2021 |
| Předmět: |
010302 applied physics
Structure formation Materials science Silicon chemistry.chemical_element 02 engineering and technology 021001 nanoscience & nanotechnology Condensed Matter Physics Lead zirconate titanate 01 natural sciences Electronic Optical and Magnetic Materials chemistry.chemical_compound Hysteresis chemistry Sputtering 0103 physical sciences Reactive plasma Thin film Composite material 0210 nano-technology |
| Zdroj: | Ferroelectrics. 575:140-143 |
| ISSN: | 1563-5112 0015-0193 |
| Popis: | The electrophysical characteristics of the PZT film formed on a silicon by the method of high-frequency reactive plasma sputtering were studied, and their relationship with the structure of the fil... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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