New high repeatability wafer geometry measurement technique for full 200mm and 300mm blank wafers

Autor:	Juan M. Trujillo-Sevilla, Álvaro Pérez-García, Óscar Casanova-González, Miriam Velasco-Ocaña, Sabato Ceruso, Ricardo Oliva-García, Óscar Gómez-Cárdenes, Javier Martín-Hernández, Alex Roqué-Velasco, José Manuel Rodríguez-Ramos, Jan O. Gaudestad
Rok vydání:	2022
Zdroj:	Photonic Instrumentation Engineering IX.
DOI:	10.1117/12.2607315
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::313e661ee7f1d259d014968102788687 https://doi.org/10.1117/12.2607315 Zobrazit plný text záznamu