Comparison of model and experiment for Ar, Ar/O2and Ar/O2/Cl2inductively coupled plasmas
| Autor: | Cheng-Che Hsu, David B. Graves, J. W. Coburn, Mark A Nierode |
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| Rok vydání: | 2006 |
| Předmět: |
Electron density
Work (thermodynamics) Acoustics and Ultrasonics Chemistry Plasma Electron Condensed Matter Physics Inductive coupling Surfaces Coatings and Films Electronic Optical and Magnetic Materials Ion Physics::Plasma Physics Physics::Space Physics Boundary value problem Atomic physics Inductively coupled plasma |
| Zdroj: | Journal of Physics D: Applied Physics. 39:3272-3284 |
| ISSN: | 1361-6463 0022-3727 |
| DOI: | 10.1088/0022-3727/39/15/009 |
| Popis: | Comparisons of fluid model predictions with various measurements in an inductively coupled plasma are reported. The gas chemistries used include pure Ar, mixtures of Ar and O2 and mixtures of Ar, O2 and Cl2 for pressures ranging from 10 to 80 mTorr and plasma densities ranging from ~1010–1011 cm−3. Measurements of electron density, electron energy probability function, positive ion composition and wall flux and neutral radical concentration at the chamber wall are reported and compared with corresponding model predictions. The model treats electrons, ions and neutrals as fluids, under the assumption of quasineutrality. Power into electrons is from inductive coupling from an external coil and capacitive coupling is neglected. The non-isothermal, multicomponent reacting flow equations with jump boundary conditions are used to describe neutrals and are solved iteratively with the plasma and electromagnetic equations until a steady solution is found. Radical and ion composition predictions are shown to be in reasonable agreement for Ar and Ar/O2 plasmas, but the corresponding predictions in mixtures of Ar, O2 and Cl2 are in only partial agreement with measurements, implying that the chemical reaction database for this chemistry requires further work. |
| Databáze: | OpenAIRE |
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