GaInAsP/InP Distributed Reflector Lasers Consisting of Deeply Etched Vertical Gratings
Autor: | Jörg Wiedmann, Bo Chen, Jong-In Shim, Shigeo Tamura, Hyo-Chang Kim, Shigehisa Arai, Masataka Ohta, Koji Ebihara |
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Rok vydání: | 2001 |
Předmět: | |
Zdroj: | Japanese Journal of Applied Physics. 40:6845 |
ISSN: | 1347-4065 0021-4922 |
DOI: | 10.1143/jjap.40.6845 |
Popis: | Deep-etching technology, which is a very simple fabrication process and requires only one lithography and one etching step without any regrowth, is applied to realize 1.5–1.55 µm wavelength GaInAsP/InP vertical grating (VG) distributed reflector (DR) lasers, which consist of a distributed feedback (DFB) region with the VG and a high-reflectivity distributed Bragg reflector (DBR) region. First, the coupling coefficient of the VG is theoretically estimated and fundamental lasing characteristics of the VG-DR lasers are investigated. Then, the fabrication process of the VG-DR lasers and the experimentally achieved fundamental lasing characteristics are given. A threshold current of 12.4 mA and a differential quantum efficiency of 42% from the front cleaved facet are achieved for a 220-µm-long and 5-µm-wide device. A submode suppression ratio (SMSR) of 33 dB at a bias current of 2.4 times the threshold is obtained. |
Databáze: | OpenAIRE |
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