Si sputtering yield amplification: a study of the collisions cascade and species in the sputtering plasma

Autor:	I. Sierra, A. Mitrani, J. L. Ruvalcaba, G. Soto-Valle, Stephen Muhl, O. De Lucio-Morales, R. Machorro-Mejía, J. Cruz, Rafael Mendoza-Perez, R. Sanginés, R.M. Calderón-Olvera
Rok vydání:	2021
Předmět:	Yield (engineering) Materials science Acoustics and Ultrasonics Cascade Sputtering Analytical chemistry Optical emission spectroscopy Plasma Thin film Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials
Zdroj:	Journal of Physics D: Applied Physics. 54:375201
ISSN:	1361-6463 0022-3727
DOI:	10.1088/1361-6463/ac0c4e
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::306fb373af78396845c8dc10f973d1ad https://doi.org/10.1088/1361-6463/ac0c4e Zobrazit plný text záznamu