Effects of vacuum ultraviolet irradiation on trapped charges and leakage currents of low-k organosilicate dielectrics
| Autor: | Dongfei Pei, J. L. Shohet, Yoshio Nishi, E. T. Ryan, X. Guo, Huifeng Zheng |
|---|---|
| Rok vydání: | 2015 |
| Předmět: | |
| Zdroj: | Applied Physics Letters. 106:192905 |
| ISSN: | 1077-3118 0003-6951 |
| Popis: | Vacuum ultraviolet (VUV) photoemission spectroscopy is utilized to investigate the distribution of trapped charges within the bandgap of low dielectric constant (low-k) organosilicate (SiCOH) materials. It was found that trapped charges are continuously distributed within the bandgap of porous SiCOH and the center of the trapped states is 1.3 eV above the valence band of the tested sample. By comparing photoemission spectroscopic results before and after VUV exposure, VUV irradiation with photon energies between 7.6 and 8.9 eV was found to deplete trapped charge while UV exposure with photon energies less than 6.0 eV induces more trapped charges in tested samples. Current-Voltage (IV) characteristics results show that the reliability of dielectrics is improved after VUV irradiation with photon energies between 7.6 and 8.9 eV, while UV exposure results in an increased level of leakage current and a decreased breakdown voltage, both of which are harmful to the reliability of the dielectric. This work shows ... |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|