Thin Films of α-Si1-xCx:H Deposited by PECVD: The r.f. Power and H2 Dilution Role

Autor:	A. M. Flank, Márcia Carvalho de Abreu Fantini, Manfredo Harri Tabacniks, R.J. Prado, Inés Pereyra
Rok vydání:	2000
Předmět:	Materials science Chemical engineering Mechanics of Materials Plasma-enhanced chemical vapor deposition Mechanical Engineering General Materials Science Thin film Condensed Matter Physics Dilution
Zdroj:	Materials Science Forum. :329-334
ISSN:	1662-9752
DOI:	10.4028/www.scientific.net/msf.338-342.329
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::303422bd02551f65daf494dad77cc8a3 https://doi.org/10.4028/www.scientific.net/msf.338-342.329 Zobrazit plný text záznamu