Lithography beamline design and exposure uniformity controlling and measuring

Autor:	Wanpo Liu, Shinan Qian, Zewen Liu, Dikui Jiang, Ya Kan, Qianhong Chen
Rok vydání:	1989
Předmět:	Materials science business.industry Bremsstrahlung Synchrotron radiation Particle accelerator Grating Electromagnetic radiation law.invention Wavelength Optics Beamline law business Instrumentation Lithography
Zdroj:	Review of Scientific Instruments. 60:2148-2149
ISSN:	1089-7623 0034-6748
DOI:	10.1063/1.1140805
Popis:	The lithography beamline design of Hefei National Synchrotron Radiation Laboratory is presented. A scanning mirror is used to cut off short wavelength radiation and to expand the vertical exposure dimension to 50 mm. A thin beryllium window is installed before the scanning mirror to prevent the longer wavelength radiation from going through. An exposure chamber with a vacuum of 5×10E−7 Torr is located at 7 m downstream from the source point. Because there is no window at the entrance of the chamber, a differential pumping system is used. The scanning mirror is driven by a stepping motor which oscillates through a 1° angle. The required driving speed curve is determined by a computer in order to obtain a uniform exposure area. An in situ moire fringe grating system is used to measure the uniformity of the motor speed.
Databáze:	OpenAIRE
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