AlN film stress and uniformity for BAW filters on 200mm wafers

Autor:	Yury Oshmyansky, Sergey Mishin
Rok vydání:	2016
Předmět:	Stress (mechanics) Materials science Sputtering business.industry Stress control 0202 electrical engineering electronic engineering information engineering Electrical engineering 020206 networking & telecommunications Wafer 02 engineering and technology Composite material business
Zdroj:	2016 IEEE International Ultrasonics Symposium (IUS).
DOI:	10.1109/ultsym.2016.7728377
Popis:	Most standard processes only require controlling average stress on the sputter deposited films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2f5071de661e5f32ab6e5cf9fc320520 https://doi.org/10.1109/ultsym.2016.7728377 Zobrazit plný text záznamu