Molecular depth profiling of polystyrene by electrospray droplet impact
| Autor: | Souichirou Mukou, Yoshitoki Iijima, Kenzo Hiraoka, Yuji Sakai |
|---|---|
| Rok vydání: | 2010 |
| Předmět: |
chemistry.chemical_classification
Electrospray Silicon Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Polymer Condensed Matter Physics Kinetic energy Surfaces Coatings and Films chemistry.chemical_compound X-ray photoelectron spectroscopy chemistry Materials Chemistry Wafer Irradiation Polystyrene |
| Zdroj: | Surface and Interface Analysis. 43:167-170 |
| ISSN: | 0142-2421 |
| DOI: | 10.1002/sia.3490 |
| Popis: | The molecular depth profiling of polymer by the electrospray droplet impact (EDI) has been performed. The multiply charged water droplets with kinetic energy of ∼106 eV were irradiated on the polystyrene spin coated on silicon wafer. With EDI etching, the ablation of the target is suppressed to a minimal, i.e. the shallow surface etching with nonrecognizable damage on the surface is realized. It was found that EDI/SIMS spectra and EDI/XPS spectra for polystyrene (PS) has shown no damage accumulation on the surface. This indicates that EDI is a unique technique for surface etching of polymer materials without causing any damage to the etched surface. Copyright © 2010 John Wiley & Sons, Ltd. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
|
Plný text