Photoinduced Doping and Photolithography of Methyl-Substituted Polyaniline
| Autor: | O. Nalamasu, X. Quan, E. Chin, Francis M. Houlihan, G. E. Johnson, G. Venugopal |
|---|---|
| Rok vydání: | 1995 |
| Předmět: |
chemistry.chemical_classification
General Chemical Engineering Doping General Chemistry Sulfonic acid Photoresist law.invention chemistry.chemical_compound chemistry Chemical engineering law Electrical resistivity and conductivity Polymer chemistry Polyaniline Materials Chemistry Photolithography Electrical conductor |
| Zdroj: | Chemistry of Materials. 7:271-276 |
| ISSN: | 1520-5002 0897-4756 |
| DOI: | 10.1021/cm00050a007 |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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