Ionic transport in fused silica and thin thermal SiO2films

Autor: D. Del Frate, G. Spinolo, S. Quilici, A. Vedda
Rok vydání: 1999
Předmět:
Zdroj: Radiation Effects and Defects in Solids. 151:47-50
ISSN: 1029-4953
1042-0150
Popis: High temperature ionic conductivity of fused silica and thin SiO2 films has been investigated in the temperature ranges 700–1400 and 570–830 K respectively by impedance spectroscopy measurements. The results are in agreement with the existence of extrinsic mechanisms in the ionic transport of both types of silicon dioxide, due to the presence of dissociated sodium ions. The numerical analysis of the experimental results led to values of 1.3 and 0.6 eV for the dissociation and migration energies, respectively. No influence of hydrogen content on alkali transport was found by considering wet and dry samples, at variance with results previously obtained on crystalline quartz.
Databáze: OpenAIRE