Ionic transport in fused silica and thin thermal SiO2films
| Autor: | D. Del Frate, G. Spinolo, S. Quilici, A. Vedda |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
Nuclear and High Energy Physics
Radiation Materials science Silicon dioxide Sodium Analytical chemistry chemistry.chemical_element Ionic bonding Condensed Matter Physics Alkali metal Dissociation (chemistry) Dielectric spectroscopy Ion chemistry.chemical_compound chemistry Ionic conductivity General Materials Science |
| Zdroj: | Radiation Effects and Defects in Solids. 151:47-50 |
| ISSN: | 1029-4953 1042-0150 |
| Popis: | High temperature ionic conductivity of fused silica and thin SiO2 films has been investigated in the temperature ranges 700–1400 and 570–830 K respectively by impedance spectroscopy measurements. The results are in agreement with the existence of extrinsic mechanisms in the ionic transport of both types of silicon dioxide, due to the presence of dissociated sodium ions. The numerical analysis of the experimental results led to values of 1.3 and 0.6 eV for the dissociation and migration energies, respectively. No influence of hydrogen content on alkali transport was found by considering wet and dry samples, at variance with results previously obtained on crystalline quartz. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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