Effect of tin-doped indium oxide film on electrodeposition of ZnO nanostructures

Autor:	Dimitrios Tamvakos, Athanasios Tamvakos, A. Pruna, D. Busquets-Mataix, Daniele Pullini
Rok vydání:	2015
Předmět:	Materials science Mechanical Engineering Nucleation Oxide chemistry.chemical_element Nanotechnology Substrate (electronics) Condensed Matter Physics Electrosynthesis chemistry.chemical_compound chemistry Chemical engineering Mechanics of Materials General Materials Science Tin Layer (electronics) Deposition (chemistry) Indium
Zdroj:	Materials Science and Technology. 31:1794-1799
ISSN:	1743-2847 0267-0836
DOI:	10.1179/1743284715y.0000000016
Popis:	Surface studies are reported for the deposition of ZnO nanostructures by one-step electrodeposition method. The electrosynthesis was perfomed at the surface of tin doped indium oxide coated glass substrates in the absence of any buffer layer. The growth of ZnO nanostructures was investigated with the morphology of substrate and the deposition mode. Combined nucleation mode was observed for the ZnO independently of substrate. The results indicated the growth, morphology and density of the ZnO nanostructures are markedly influenced by both the substrate and the deposition conditions. It was observed the ZnO formation is defect site driven in case of galvanostatic deposition mode, while in case of potentiostatic deposition mode, it is dependent on the roughness of the substrate.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2eba7b4e13562d09b33e4bd536a37872 https://doi.org/10.1179/1743284715y.0000000016 Zobrazit plný text záznamu Plný text ve formátu PDF Plný text ve formátu HTML
Nepřihlášeným uživatelům se plný text nezobrazuje	K zobrazení výsledku je třeba se přihlásit.