Measurement of stress in a synthetic diamond substrate using the photoelastic method
| Autor: | Hancheng Liang, Andrei Vescan, Ken K. Chin, Erhard Kohn |
|---|---|
| Rok vydání: | 1996 |
| Předmět: |
Materials science
Birefringence Synthetic diamond Noise (signal processing) business.industry Mechanical Engineering General Chemistry Electronic Optical and Magnetic Materials law.invention Stress (mechanics) Optics Data acquisition law Residual stress Digital image processing Materials Chemistry Shear stress Electrical and Electronic Engineering business |
| Zdroj: | Diamond and Related Materials. 5:664-668 |
| ISSN: | 0925-9635 |
| DOI: | 10.1016/0925-9635(95)00455-6 |
| Popis: | The residual stress in a synthetic diamond substrate was analyzed using an automatic data acquisition and analysis system based on photoelastic principles. Digital image processing techniques were applied to improve the quality of the sensed images, to reduce noise and to determine the boundary of the measured samples. Methods were also introduced to calculate the birefringence phase difference and principal stress directions. The shearing stress difference method was applied to calculate the two-dimensional stress distribution. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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