Plasma oxidation of Cu, Ti and Ni and the photoelectrochemical properties of the oxide layers formed

Autor:	Ryoichi Urao, Mohammed Rafiqul Islam, Yoshihiro Momose, Tetsuo Muranoi, Manabu Takeuchi, Masayoshi Masui
Rok vydání:	1996
Předmět:	Glow discharge chemistry.chemical_compound Aqueous solution Electron diffraction Chemistry Inorganic chemistry Non-blocking I/O Electrode Oxide General Materials Science Photoelectrochemical cell Condensed Matter Physics Anode
Zdroj:	Materials Chemistry and Physics. 43:283-286
ISSN:	0254-0584
DOI:	10.1016/0254-0584(95)01631-4
Popis:	Plasma oxidation of Ti, Cu and Ni was carried out using a conventional diode-type glow discharge system. Structural and photoelectrochemical properties of the oxide layers formed were examined. Electron diffraction confirmed the formation of a TiO2, Cu2O/CuO, and NiO layer on the Ti, Cu, and Ni surfaces, respectively, after the plasma oxidation. Photoelectrochemical solar cells were fabricated using the oxide layers formed as a semiconductor electrode. The TiO2 electrodes showed moderate photoresponse under anodic potentials in a methanol aqueous solution, while the Cu2O/CuO and NiO electrodes showed a weak photoresponse under cathodic potentials. In conclusion, the TiO2 layers prepared by plasma oxidation work well as a semiconductor electrode for a photoelectrochemical cell and are stable in methanol solution.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2e71095c99c0be933c969ca04fc0cfc7 https://doi.org/10.1016/0254-0584(95)01631-4 Zobrazit plný text záznamu Full Text from ScienceDirect