X-ray production simulation of an electron beam recycled through a betatron's internal target

Autor:	Louis W. Lombardo, Melvin A. Piestrup, V.V. Kaplin, S. R. Uglov, A. A. Mihal'chuk
Rok vydání:	1998
Předmět:	Physics Nuclear and High Energy Physics Silicon business.industry X-ray chemistry.chemical_element Electron Betatron Optics chemistry Cathode ray Atomic physics business Instrumentation Beam energy Beam (structure) Parametric statistics
Zdroj:	Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms. 145:244-252
ISSN:	0168-583X
Popis:	An analysis of the circulating dynamics of 6 and 35 MeV electron beams in betatron chambers with quasi-transparent internal targets has been done by means of computer simulation. The spatial and angular distributions of the electron trajectories were studied as the electrons made multiple passes through the thin targets. The beam intensities were observed as a function of the number of passes through 0.01, 0.02, 0.05, and 0.1 mm thick silicon targets. The mean number of passes that an electron makes was determined for each combination of target thickness and beam energy. Using the data obtained from the simulation, the spectral and angular distributions of parametric X-radiation have been calculated for electrons recycled through silicon crystals.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2e12f9290889e25a599ce34b4d75cecf https://doi.org/10.1016/s0168-583x(98)00377-2 Zobrazit plný text záznamu Full Text from ScienceDirect