SELURIS® Clean – Superior & ESH-Friendly Solution for In-Line P-Diffusion Pre- and Post-Treatment
Autor: | Ferstl, B., Braun, S., Bebber, J., Albering, H. |
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Jazyk: | angličtina |
Rok vydání: | 2010 |
Předmět: | |
DOI: | 10.4229/25theupvsec2010-2cv.1.65 |
Popis: | 25th European Photovoltaic Solar Energy Conference and Exhibition / 5th World Conference on Photovoltaic Energy Conversion, 6-10 September 2010, Valencia, Spain; 1648-1650 BASF introduces SELURIS® Clean, a new generation of ESH-friendly chemistry for improved wettability, cleaning and passivation of solar cell wafers. SELURIS® Clean is non-foaming and is intended mainly for the use along in-line doping. We present results of comparative dopant wetting tests on polycrystalline wafers, which show outstanding wetting capability. This was achieved amongst others by sophisticated selection of ingredients, thus providing homogeneous distribution of the dopant across the wafer surface. We also present the significant improvement on cell performance, i.e. efficiency and fill factor, induced by SELURIS® Clean. |
Databáze: | OpenAIRE |
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