Ion-beam-assisted deposition of magnetron-sputtered metal nitrides
| Autor: | U. Herrmann, A. Schröer, K.-H. Bäther |
|---|---|
| Rok vydání: | 1995 |
| Předmět: |
Materials science
Ion beam Inorganic chemistry Ion plating Surfaces and Interfaces General Chemistry Sputter deposition Condensed Matter Physics Surfaces Coatings and Films Ion beam deposition Sputtering Materials Chemistry Electron beam-induced deposition Thin film Composite material Ion beam-assisted deposition |
| Zdroj: | Surface and Coatings Technology. :793-801 |
| ISSN: | 0257-8972 |
| DOI: | 10.1016/0257-8972(95)08277-8 |
| Popis: | The refractory metal nitrides Ti-N, Zr-N, V-N, Nb-N, Ta-N, Cr-N, Mo-N and W-N and in addition the Al-N and Si-N systems were deposited with conventional d.c. magnetron sputtering and with ion-beam-assisted deposition on thermally oxidized silicon wafers and polished steel plates. It was possible to distinguish between three sets of materials related to their deposition conditions and coating properties. The deposition process and the coating properties were modified by the ion beam assistance. During the deposition the ion beam bombardment influences only the deposition rate because of the sputter loss. An influence on reactivity of magnetron sputtering by the ion beam bombardment was not observed. The ion bombardment leads generally to significant changes in coating properties, such as the tribomechanicai behaviour. These improved properties result from the dense microcrystalline structure. |
| Databáze: | OpenAIRE |
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