Structural phase changes in a titanium-silicon system modified by high-current electron beams and compression plasma flows

Autor:	V. M. Astashinskii, R. S. Kudaktin, Yu. F. Ivanov, A. M. Kuz’mitskii, Vladimir V. Uglov, N.T. Kvasov, Yu. A. Petukhov, Anton D. Teresov, Nikolay N. Koval
Rok vydání:	2012
Předmět:	Materials science Silicon Scanning electron microscope Analytical chemistry chemistry.chemical_element Electron microprobe Surfaces Coatings and Films chemistry.chemical_compound chemistry Silicide Heat transfer Thin film Composite material Power density Titanium
Zdroj:	Journal of Surface Investigation. X-ray, Synchrotron and Neutron Techniques. 6:296-302
ISSN:	1819-7094 1027-4510
DOI:	10.1134/s1027451012040180
Popis:	Structural phase changes in a titanium-silicon system treated by low-energy high-current electron beams (HCEBs) and compression plasma flows (CPFs) with the duration 100 μs and the energy density 12–15 J/cm2 are studied. Scanning electron microscopy, X-ray diffraction and electron microprobe analysis are used in this work. The formation of a titanium-doped silicon layer 10–25 μm thick, titanium silicides (TiSi2 under HCEBs and Ti5Si3 under CPF treatment), silicon dendrites, and needle-like eutectics (typical size of precipitates is about 50 nm) is revealed. It is shown via the results of numerical simulation that the thickness of the metal-doped layer is mainly controlled by the power density value and the surface nonuniformity of the heat flow over the target surface. The thermodynamic regularities of phase formation are discussed, taking into account heat transfer between the silicide nuclei and solid silicon.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2dcfe9d0a17762e27e6f3b1dc22cad71 https://doi.org/10.1134/s1027451012040180 Zobrazit plný text záznamu Full text from SpringerLink