Substituted polyhydroxystyrenes as matrix resins for chemically amplified deep UV resist materials
| Autor: | Winfried Meier, Ralph R. Dammel, Charlotte Dammel, Klause-Jürgen Przybilla, Charlet R. Lindley, Walter Spiess, Horst Röschert, Georg Pawlowski |
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| Rok vydání: | 1991 |
| Předmět: |
chemistry.chemical_classification
Aqueous solution Materials science Polymer Condensed Matter Physics Atomic and Molecular Physics and Optics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Matrix (chemical analysis) chemistry Resist Chemical engineering Polymer chemistry Electrical and Electronic Engineering |
| Zdroj: | Microelectronic Engineering. 13:29-32 |
| ISSN: | 0167-9317 |
| DOI: | 10.1016/0167-9317(91)90041-b |
| Popis: | Substituted poly(4-hydroxystyrene)s provide an interesting source of film forming, deep UV transparent, aqueous alkaline developable polymers with a broad potential for modification of their chemical and physical properties. After a review of their synthesis and physical properties, selected examples of their use in chemically amplified resist systems, both positive and negative, will be presented. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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