The defect distribution and chemical etching of Langasite (La3Ga5SiO14) crystals grown by the Czochralski method
| Autor: | Keun Ho Auh, Il Hyoung Jung, Tsuguo Fukuda, Kwang Bo Shim |
|---|---|
| Rok vydání: | 2000 |
| Předmět: |
Materials science
Silica gel Mechanical Engineering Colloidal silica Inorganic chemistry Polishing Surface finish Condensed Matter Physics Isotropic etching Crystallographic defect Piezoelectricity chemistry.chemical_compound chemistry Chemical engineering Mechanics of Materials Etching (microfabrication) General Materials Science |
| Zdroj: | Materials Letters. 46:354-357 |
| ISSN: | 0167-577X |
| DOI: | 10.1016/s0167-577x(00)00200-7 |
| Popis: | The defect distribution of grown Langasite crystals as different growth conditions and selective chemical etching on La 3 Ga 5 SiO 14 single crystals of various etchants were investigated. The applications of piezoelectric devices were shown to be necessary to ensure a high surface finish. Colloidal silica was found to produce the best polishing effect and H 3 PO 4 -based etchants were shown in distinct selective etching effect and HF-based etchants were shown in reduction of roughness. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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