| Popis: |
Due to the stringent requirements on the lateral alignment and the large number of steps required to fabricate diffractive optics by typical microlithographic techniques, the need for more efficient methods to fabricate these elements has arisen. This paper discusses the use of electron beam lithography in fabricating diffractive optical elements by direct e-beam alignment and direct write into the electron beam resist. Many of the practical advantages and disadvantages of each method will be pointed out. In particular, current research and future research directions into such direct write problems as the proximity effect, hologram ruggedness, and lengthy exposure times will be addressed. |
