Multicusp sources for ion beam projection lithography

Autor:	D. Wutte, Jasmina Vujic, Y. Lee, N. Zahir, Ka-Ngo Leung, M. D. Williams, W.B. Kunkel, R. A. Gough
Rok vydání:	1998
Předmět:	Materials science Ion beam Particle accelerator Plasma Ion gun Ion beam lithography law.invention Ion Ion beam deposition Physics::Plasma Physics law Laser beam quality Atomic physics Instrumentation
Zdroj:	Review of Scientific Instruments. 69:877-879
ISSN:	1089-7623 0034-6748
DOI:	10.1063/1.1148469
Popis:	Multicusp ion sources are capable of producing positive and negative ions with good beam quality and low energy spread. The ion energy spread of multicusp sources has been measured by three different techniques. The axial ion energy spread has been reduced by introducing a magnetic filter inside the multicusp source chamber which adjusts the plasma potential distribution. The axial energy spread is further reduced by optimizing the source configuration. Values as low as 0.8 eV have been achieved.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2c9850bf10338da199f04f15b7a237f9 https://doi.org/10.1063/1.1148469 Zobrazit plný text záznamu