Electrochemical Characterizations on Chemical Mechanical Polishing Compositions of Polishing Ruthenium Films in CMP Processes
Autor: | Tom X. Shi, James Henry, James Schlueter |
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Rok vydání: | 2012 |
Zdroj: | ECS Meeting Abstracts. :2486-2486 |
ISSN: | 2151-2043 |
Popis: | not Available. |
Databáze: | OpenAIRE |
Externí odkaz: |