PECVD of Carbon Nanostructures in Hydrocarbon-Based RF Plasmas

Autor:	Igor Denysenko, P.P. Rutkevych, Jidong Long, Z Tsakadze, Shuyan Xu, Ken Ostrikov
Rok vydání:	2005
Předmět:	chemistry.chemical_classification Materials science Hydrogen chemistry.chemical_element Chemical vapor deposition Condensed Matter Physics Methane chemistry.chemical_compound Hydrocarbon Carbon film chemistry Chemical engineering Plasma-enhanced chemical vapor deposition Thin film Carbon
Zdroj:	Contributions to Plasma Physics. 45:514-521
ISSN:	1521-3986 0863-1042
Popis:	Different aspects of the plasma-enhanced chemical vapor deposition of various carbon nanostructures in the ionized gas phase of high-density, low-temperature reactive plasmas of Ar+H2+CH4 gas mixtures are studied. The growth techniques, surface morphologies, densities and fluxes of major reactive species in the discharge, and effects of the transport of the plasma-grown nanoparticles through the near-substrate plasma sheath are examined. Possible growth precursors of the carbon nanostructures are also discussed. In particular, the experimental and numerical results indicate that it is likely that the aligned carbon nanotip structures are predominantly grown by the molecular and radical units, whereas the plasma-grown nanoparticles are crucial components of polymorphous carbon films.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2bfdf758e59ae8992a3f87f3d81e6b2e https://doi.org/10.1002/ctpp.200510057 Zobrazit plný text záznamu Plný text