Status of DPP EUV sources development for Beta/HVM

Autor:	Guido Schriever, Peter Zink, Marc Corthout, Masaki Yoshioka
Rok vydání:	2008
Předmět:	Engineering Optics business.industry Extreme ultraviolet lithography Systems engineering business Power level
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.804687
Popis:	XTREME technologies and Philips EUV have provided the majority of available EUV sources based on Discharge Produced Plasma (DPP) technology worldwide since 2003. The fact that all existing prototype scanners make use of DPP sources and that further power scaling and debris mitigation upgrades are made according to plan clearly contributes to the maturity of this technology. We will present the latest status of our tin based DPP sources in the joint development work of XTREME technologies and Philips EUV. Demonstration experiments pave the way for this technology towards the HVM power level.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2b54ba5a0a353bb7305f169f20e9bbb1 https://doi.org/10.1117/12.804687 Zobrazit plný text záznamu