SADP etch process development using PR core for sub 17nm DRAM
Autor: | Li Tian Xu, Shuai Zhang, Ling Feng Li, Hao Liu, Xin Wen Huang, Ying Yi Chen, Xian Wen Su, Zhong Ning Guo, Chun Yu Xiu, Tian Lei Mu, Bing Hui Lin, Zhong Yi He, Qing Jun Zhou |
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Rok vydání: | 2022 |
Zdroj: | 2022 China Semiconductor Technology International Conference (CSTIC). |
Databáze: | OpenAIRE |
Externí odkaz: |