Plasma assisted deposition of Pd thin films
| Autor: | A.L. Thomann, Claude Laure, A. Naudon, Bernard Rousseau, Pascal Brault, H. Estrade-Szwarckopf, C. Andreazza-Vignolle, Pascal Andreazza |
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| Rok vydání: | 1998 |
| Předmět: |
Materials science
Silicon Analytical chemistry chemistry.chemical_element Surfaces and Interfaces General Chemistry Condensed Matter Physics Surfaces Coatings and Films symbols.namesake chemistry Sputtering Monolayer Materials Chemistry symbols Deposition (phase transition) Langmuir probe Plasma diagnostics Crystallite Thin film |
| Zdroj: | Surface and Coatings Technology. 98:1228-1232 |
| ISSN: | 0257-8972 |
| Popis: | In this work we studied the deposition of Pd on a silicon surface by a non-conventional plasma assisted deposition technique. The Pd source is a negatively biased Pd wire located in the deposition chamber and sputtered by the plasma ions. Emission spectroscopy and Langmuir probe measurements are used to characterize the plasma and to determine the experimental parameters influencing the deposit features, especially the Pd deposition rate (1–5 ML min −1 ) (ML = monolayer). It has been evidenced that exact control of the deposited Pd quantity (several ML) can be performed by adjusting the deposition time duration or the Pd wire bias. The Pd films devoted to catalysis applications, exhibit interesting characteristic: they are polycrystalline, flat and composed of small Pd spheres with a diameter of hundreds A. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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