Photostabilization of an epoxy resin by forming interpenetrating polymer networks with bisphenol-A diacrylate
| Autor: | Lon-An Cheng, Ming-Wei Wang, Mu-Shih Lin |
|---|---|
| Rok vydání: | 1999 |
| Předmět: |
Acrylate polymer
Bisphenol A Diglycidyl ether Materials science Polymers and Plastics Epoxy Benzoyl peroxide Condensed Matter Physics chemistry.chemical_compound chemistry Mechanics of Materials visual_art Polymer chemistry Materials Chemistry visual_art.visual_art_medium medicine Interpenetrating polymer network Polymer blend Curing (chemistry) medicine.drug |
| Zdroj: | Polymer Degradation and Stability. 66:343-347 |
| ISSN: | 0141-3910 |
| DOI: | 10.1016/s0141-3910(99)00085-3 |
| Popis: | Bisphenol-A diacrylate (BADA) was synthesized from the reaction of bisphenol-A and acrylol chloride. Interpenetrating polymer networks (IPNs) based on diglycidyl ether of bisphenol-A (DGEBA) and BADA in weight ratios of DGEBA/BADA=100/0, 75/25 and 50/50 were prepared by using 4,4′-diaminodiphenylmethane (MDA) and benzoyl peroxide (BPO) as curing agents. Samples were irradiated with ultraviolet in a Q-UVA weather-o-meter to study their aging behavior. Experimental results indicated that the BADA thus incorporated in the IPN structure confers significant photostabilization of the epoxy, as shown by less chain scission at C O C in the epoxy, with less property loss in mechanical tests. |
| Databáze: | OpenAIRE |
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