Preferential alignment of Co moments at oxide/Co interface in Si/Co/Co-oxide/Cowedge/Pt structure
| Autor: | Dileep Kumar, Pooja Gupta, Md. Shahid Jamal |
|---|---|
| Rok vydání: | 2020 |
| Předmět: |
010302 applied physics
Preferential alignment Materials science Kerr effect Magnetoresistance Condensed matter physics Metals and Alloys Oxide 02 engineering and technology Surfaces and Interfaces 021001 nanoscience & nanotechnology 01 natural sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials Magnetic anisotropy chemistry.chemical_compound chemistry Phase (matter) 0103 physical sciences Materials Chemistry 0210 nano-technology Anisotropy Layer (electronics) |
| Zdroj: | Thin Solid Films. 709:138246 |
| ISSN: | 0040-6090 |
| Popis: | Magnetization reversal process in Si/Co/Co-oxide/CoWedge/Pt structure with increasing thickness of CoWedge layer has been studied with an aim to explore the effect of interface oxidation on the preferential alignment of Co spins at Co-oxide/CoWedge interface. Oxide layer is prepared at the surface of Co layer by heating it in the presence of oxygen partial pressure. Top Co layer (CoWedge) was deposited in the form of wedge with thickness gradient ~0.11 nm/mm across the full length (55 mm) of the Si substrate. Azimuthal angle dependent magneto-optic Kerr effect and magnetoresistance measurements in both transverse and longitudinal geometries revealed that despite of degraded growth, oxidized interface is responsible for the preferential alignment of Co spins at the interface. During the initial stages of Co deposition on Co-Oxide layer, the possible Co–O hybridization at the interface leads to the Co–O bonds alignments perpendicular to the interface which helped Co layer to grow in hcp phase with c-axis aligned preferentially perpendicular to the film surface. Combined effect of volume and interface magnetic anisotropy is attributed to overcome the shape anisotropy and responsible for the origin of perpendicular magnetic anisotropy (PMA) in the CoWedge layer. Variation in PMA with increasing thickness of CoWedge (0.6 nm to 5.6 nm) could be understood primarily in terms of film morphology, which changed significantly with film thickness. |
| Databáze: | OpenAIRE |
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