Influence of Technological Process for Microelectromechanical Sensors Manufacturing on their Technical Characteristics
| Autor: | A N Koleda, E S Barbin, Tamara Nesterenko |
|---|---|
| Rok vydání: | 2019 |
| Předmět: |
Microelectromechanical systems
Glass etching Materials science Mechanical Engineering 010401 analytical chemistry Process (computing) Nanotechnology 02 engineering and technology Photoresist 021001 nanoscience & nanotechnology Condensed Matter Physics 01 natural sciences 0104 chemical sciences Mechanics of Materials General Materials Science 0210 nano-technology |
| Zdroj: | Materials Science Forum. 970:123-129 |
| ISSN: | 1662-9752 |
| DOI: | 10.4028/www.scientific.net/msf.970.123 |
| Popis: | The article discusses the technological process for MEMS sensors manufacturing, which provides the minimum allowable technological defects to achieve MEMS technical characteristics. The paper deals with experiments on the definition of technological operations and the choice of their parameters. The factors influencing the size of technological defects are revealed. There is a technology to manufacture MEMS considered as "silicon on glass." There were successful experiments with the use of mask thickness of 540 nm and 450 nm. The slope of the faces does not exceed 1o, the maximum height of the surface roughness profile was 75 nm. |
| Databáze: | OpenAIRE |
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