Autor:	Eugene L. Church, John C. Stover
Rok vydání:	1996
Předmět:	Haze Materials science Geometrical optics Scattering business.industry Mathematical analysis Polarimetry Perturbation (astronomy) Light scattering Air contamination symbols.namesake Optics symbols Rayleigh scattering business
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
DOI:	10.1117/12.256191
Popis:	This paper derives the Mueller scattering matrices for two topographic scattering models--the Rayleigh-Rice or perturbation model and the geometrical-optics or facet model. The results are used to predict the polarimetric properties of the `haze' on silicon-wafer surfaces.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2a460b00c916f86f9c0f9e4d8885e7f0 https://doi.org/10.1117/12.256191 Zobrazit plný text záznamu