Controlled Growth of Palladium Nanoparticles on Graphene Nanoplatelets via Scalable Atmospheric Pressure Atomic Layer Deposition
| Autor: | Ryan Helmer, Aristeidis Goulas, Fabio Grillo, Hao Van Bui, J. Ruud van Ommen |
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| Rok vydání: | 2016 |
| Předmět: |
Materials science
Atmospheric pressure Graphene Graphene foam Nucleation Nanotechnology 02 engineering and technology 010402 general chemistry 021001 nanoscience & nanotechnology 01 natural sciences 0104 chemical sciences Surfaces Coatings and Films Electronic Optical and Magnetic Materials law.invention Atomic layer deposition General Energy Chemical engineering law Particle size Physical and Theoretical Chemistry 0210 nano-technology Graphene nanoribbons Graphene oxide paper |
| Zdroj: | The Journal of Physical Chemistry C. 120:8832-8840 |
| ISSN: | 1932-7455 1932-7447 |
| DOI: | 10.1021/acs.jpcc.6b02285 |
| Popis: | We demonstrate the deposition of crystalline palladium nanoparticles on graphene nanoplatelets (Pd/graphene) via atmospheric pressure atomic layer deposition (ALD) carried out in a fluidized bed reactor. The nucleation and growth of Pd nanoparticles on the inert graphene surface was enabled by applying an ozone pretreatment step, without significantly affecting the graphene crystalline structure. Uniform nucleation on both basal planes and edges of the graphene was obtained. The Pd loading and dispersion as well as the average particle size could be controlled by varying the number of ALD cycles. By analyzing the evolution of the particle size distribution and spatial density, we obtained insights into the nucleation and growth of Pd ALD on graphene. Furthermore, by shortening the pretreatment time, selective growth of Pd nanoparticles on the edges of the graphene was achieved. The Pd/graphene fabricated with our method showed a significantly lower level of impurities compared to the Pd/graphene synthesiz... |
| Databáze: | OpenAIRE |
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