The combined effects of Fe and H2 on the nitridation of silicon

Autor:	Nancy J. Shaw
Rok vydání:	1982
Předmět:	Materials science Hydrogen Silicon Metallurgy Analytical chemistry chemistry.chemical_element Microstructure chemistry Powder metallurgy X-ray crystallography General Materials Science Wafer Single crystal Nitriding
Zdroj:	Journal of Materials Science Letters. 1:337-340
ISSN:	1573-4811 0261-8028
DOI:	10.1007/bf00726480
Popis:	In view of the support offered by previous work for the suggestion that Fe may affect alpha-Si3N4 formation and microstructural development, a two-part study was conducted to differentiate the effects of H2 and Fe in, first, the nitridation of pure and of Fe-containing powder in N2 and N2-4% H2, and then the nitridation of (1 1 1) Si single crystal wafers with and without Fe powder on the surface. The degree of nitridation is most strongly affected by H2 at 1200 C, but by Fe at 1375 C, where Fe-containing samples in either atmosphere were almost completely nitrided. While neither H2 nor Fe alone changed the ratio of alpha-Si3N4 to beta-Si3N4, the combination of H2 and Fe increased it at both temperatures.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2a399db03fe1a080ca21eb9a657e0cad https://doi.org/10.1007/bf00726480 Zobrazit plný text záznamu Full text from SpringerLink