Low-absorption measurement of optical thin films using the photothermal surface-deformation technique

Autor:	Ton Thi Ngoc Lan, Heinz G. Walther, P. Eckardt, E. Welsch
Rok vydání:	1988
Předmět:	Physics business.industry Absorptance General Physics and Astronomy Deposition (phase transition) Optoelectronics Substrate (electronics) Thin film Photothermal therapy Absorption (electromagnetic radiation) business Evaporation (deposition) Beam (structure)
Zdroj:	Canadian Journal of Physics. 66:638-644
ISSN:	1208-6045 0008-4204
Popis:	The purpose of this paper is to show both theoretically and experimentally the feasibility of the photothermal surface-deformation (PTD) technique for a highly sensitive, completely contactless detection, as well as a lateral and depth-resolved localization, of absorption in optical thin films. Peculiarities in the interpretation of the measuring signal, such as the influence of the thermal-expansion coefficient of the substrate and the focal diameter of the heating beam, have been pointed out.As a relevant example, the absorption of evaporated ZrO2, single layers on BK 7 substrates has been measured at λ = 515 nm. Their bulk absorption is shown to be strongly influenced by both deposition parameters and the baking procedure.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::29fdc82349777eafd8c0ca3d03ee2c9b https://doi.org/10.1139/p88-106 Zobrazit plný text záznamu