Surface Planarization Process of RB-SiC Based on Magnetron Sputtering and ICP Etching

Autor:	刘卫国 Liu Weiguo, 赵杨勇 Zhao Yang-yong, 惠迎雪 Xi Ying-xue
Rok vydání:	2018
Předmět:	Materials science business.industry Etching (microfabrication) Chemical-mechanical planarization Scientific method Optoelectronics Sputter deposition business Atomic and Molecular Physics and Optics
Zdroj:	ACTA PHOTONICA SINICA. 47:324001
ISSN:	1004-4213
DOI:	10.3788/gzxb20184703.0324001
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::29de8705dddc886b31f367d826413687 https://doi.org/10.3788/gzxb20184703.0324001 Zobrazit plný text záznamu