| Autor: |
J. K. Tsai, J. C. Lin, Y. P. Luo, S. J. Young, Teen-Hang Meen, T. C. Wu, S. J. Chang, B. Y. Lee, K. C. Lee, Liang-Wen Ji, I. T. Tang |
| Rok vydání: |
2014 |
| Předmět: |
|
| Zdroj: |
2014 International Conference on Information Science, Electronics and Electrical Engineering. |
| DOI: |
10.1109/infoseee.2014.6948069 |
| Popis: |
In this study, titanium dioxide (TiO 2 ) films were prepared on Corning glass substrates by radio frequency (RF) magnetron sputtering and treated without and with O 2 plasma conditions, and then were used to fabricate metal-semiconductor-metal (MSM) ultraviolet (UV) photodetectors (PDs). The effects of the changes on TiO 2 films were investigated by using field-emission scanning electron microscope (FE-SEM), photoluminescence (PL) system and four-point probe measurement. With a 360-nm illumination and 5 V applied bias, it was found that the responsivities of the fabricated TiO 2 PDs without and with 2 minutes O 2 plasma treatment were 36 and 153 A/W, respectively. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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