| Autor: |
Lena Zavyalova, Gary Zhang, Donis G. Flagello, Bruce W. Smith, Patrick Reynolds, Anatoly Bourov, Venugopal Vellanki |
| Rok vydání: |
2006 |
| Předmět: |
|
| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| Popis: |
An automated aberration extraction method is presented which allows extraction of lithographic projection lens' aberration signature having only access to object (mask) and image (wafer) planes. Using phase-wheel targets on a two-level 0/ir phase shift mask, images with high sensitivity to aberrations are produced. Zemike aberration coefficients up to 9 th order have been extracted by inspection of photoresist images captured via top-down SEM. The automated measurement procedure solves a multi-dimensional optimization problem using numerical methods and demonstrates improved accuracy and minimal cross-correlation. Starting with a detailed procedure analysis, recent experimental results for 193-nm projection optics in commercial full field exposure tools are discussed with an emphasis on the performance of the aberration measurement approach. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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