Plasma Nitrogen Doping of Nanostructured Reduced Graphene Oxide

Autor: A. S. Pushkarev, M V Kozlova, Ratibor G. Chumakov, Valery N. Kalinichenko, Vladimir N. Fateev, O. K. Alekseeva, B. L. Shapir, I. V. Pushkareva, V. V. Tishkin
Rok vydání: 2020
Předmět:
Zdroj: Nanotechnologies in Russia. 15:735-740
ISSN: 1995-0799
1995-0780
Popis: Carbon nanomaterials doped with heteroatoms, in particular, nitrogen atoms, are of great interest for electrochemical power engineering as nonmetallic catalysts or carriers of catalytically active metal nanoparticles. A nanostructured, reduced graphene oxide modified with nitrogen in a gas discharge plasma in a vacuum chamber of a magnetron-ion sputtering facility is considered. It is shown that plasma treatment of reduced graphene oxide does not cause undesirable morphological changes in the structure of carbon nanomaterial, but it leads to the incorporation of nitrogen atoms into the structure of reduced graphene oxide with the formation of pyridine-, pyrrole-, and graphite-like configurations. The application of pulsed negative bias voltages of various magnitudes to the substrate with the sample increases the concentration of nitrogen atoms to 2.6 at % and also promotes an increase in the proportion of nitrogen atoms in the pyridine form and a slight decrease in the proportion of atoms in the pyrrole form. The results allow for considering the obtained carbon nanomaterials for use as components of electrochemical devices, for example, fuel cells, in the future.
Databáze: OpenAIRE
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