A Study of Atomic Layer Deposition and Reactive Plasma Compatibilitywith Mesoporous Organosilicate Glass Films

Autor:	David W. Gidley, Jim Connor, E. Todd Ryan, Todd Guenther, Lynne Svedberg, Melissa Freeman, Jianing Sun, Katie Yu, Jen-Jiang Lee
Rok vydání:	2003
Předmět:	Metal Atomic layer deposition Materials science visual_art Positron Lifetime Spectroscopy visual_art.visual_art_medium Microporous material Penetration (firestop) Plasma Composite material Mesoporous material Porosity
Zdroj:	MRS Proceedings. 766
ISSN:	1946-4274 0272-9172
DOI:	10.1557/proc-766-e10.8
Popis:	The compatibility of ALD and CVD metal deposition with mesoporous and microporous carbon-doped organosilicate glass (OSG) films was examined. Blanket film studies using TEM, TOF-SIMS, and positron lifetime spectroscopy demonstrate that ALD Wand TaN penetrate deep into the mesoporous film via the film's connected pore structure. In contrast, metal penetration into microporous OSG films was not observed. He and NH3 plasma pretreatments to the mesoporous OSG film surface did not seal the mesopores to ALD metal penetration, but the plasmas did damage the bulk of the mesoporous OSG film with varying severity. The results indicate that porosity, pore size, and/or pore structure regulate ALD/CVD precursor diffusion and that ALD metal deposition is a good probe of pore sealing strategies.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::28ab0358e5aa80b81cee378684e8f5a7 https://doi.org/10.1557/proc-766-e10.8 Zobrazit plný text záznamu Full text from SpringerLink