Plasma density control in a low-pressure RF resonant field

Autor:	Naohiko Goto
Rok vydání:	1998
Předmět:	Acoustics and Ultrasonics Field (physics) Chemistry Plasma Electron Condensed Matter Physics Surfaces Coatings and Films Electronic Optical and Magnetic Materials Magnetic field Ionization Electric field Plasma diagnostics Atomic physics Electron ionization
Zdroj:	Journal of Physics D: Applied Physics. 31:428-433
ISSN:	1361-6463 0022-3727
DOI:	10.1088/0022-3727/31/4/012
Popis:	A theoretical study of plasma density control in a RF resonant field has been carried out. The equation expressing the RF resonant field is derived from the dispersion relation for electrostatic electron waves propagating at an angle relative to the magnetic field. Calculations were executed by varying the magnetic flux density at 0.133 Pa and demonstrate the RF resonant field in the condition under which parameters satisfy the equation. The RF resonant field allows an electric field to be induced in bulk plasma, which generates ions in the bulk as a result of electron impact ionization. The low magnetic flux density, 5 mT, facilitates control of the plasma density in the bulk by allowing adjustment of the extent of the ionization even at low pressures such as 0.133 Pa.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2891e18dc1fc368f66c32d414aec0230 https://doi.org/10.1088/0022-3727/31/4/012 Zobrazit plný text záznamu