ChemInform Abstract: Kinetic Study of Dimesitylsilylene by Laser Flash Photolysis

Autor: J. C. Scaiano, S. Zhang, R. T. Conlin, J. C. Netto-Ferreira
Rok vydání: 1990
Předmět:
Zdroj: ChemInform. 21
ISSN: 0931-7597
DOI: 10.1002/chin.199031097
Popis: The rate constants for the self-reaction of dimesitylsilylene as well as for representative quenchers have been measured with laser flash photolysis techniques. Decay of the silylene, generated from 266-nm photolysis of the corresponding trisilane in cyclohexane, was monitored at 580 nm
Databáze: OpenAIRE