ChemInform Abstract: Kinetic Study of Dimesitylsilylene by Laser Flash Photolysis
Autor: | J. C. Scaiano, S. Zhang, R. T. Conlin, J. C. Netto-Ferreira |
---|---|
Rok vydání: | 1990 |
Předmět: | |
Zdroj: | ChemInform. 21 |
ISSN: | 0931-7597 |
DOI: | 10.1002/chin.199031097 |
Popis: | The rate constants for the self-reaction of dimesitylsilylene as well as for representative quenchers have been measured with laser flash photolysis techniques. Decay of the silylene, generated from 266-nm photolysis of the corresponding trisilane in cyclohexane, was monitored at 580 nm |
Databáze: | OpenAIRE |
Externí odkaz: |