Inspection of aggressive OPC using aerial image-based mask inspection

Autor:	Yuval Blumberg, Hong-Chang Hsieh, Anja Rosenbusch, Reuven Falah, Luke T. H. Hsu, Johnson Chang-Cheng Hung
Rok vydání:	2003
Předmět:	Automated optical inspection Engineering business.industry Aerial imaging High density Mask inspection Integrated circuit layout Automated X-ray inspection Optical proximity correction Hardware_INTEGRATEDCIRCUITS Computer vision Artificial intelligence business Aerial image
Zdroj:	SPIE Proceedings.
ISSN:	0277-786X
Popis:	Inspection of aggressive OPC represents one of the major challenges for today's mask inspection methodologies. Systems are phased with high-density layouts, containing OPC features far below the resolution limit of conventional inspection systems. This causes large amounts of false and nuisance defects, especially on production applications. The paper presents the use of Aera193, a new inspection system using aerial imaging as inspection methodology.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::28144cb711aa7a9267b01480fe9b4784 https://doi.org/10.1117/12.504058 Zobrazit plný text záznamu