Spreading-resistance temperature sensor on silicon-on-insulator

Autor: P.T. Lai, J.K.O. Sin, C.L. Chan, Bin Li
Rok vydání: 1999
Předmět:
Zdroj: IEEE Electron Device Letters. 20:589-591
ISSN: 1558-0563
0741-3106
DOI: 10.1109/55.798053
Popis: A spreading-resistance temperature (SRT) sensor is fabricated on silicon-on-insulator (SOI) substrate and achieves promising characteristics as compared with similar SRT sensor on bulk silicon wafers. Moreover, experimental results show that the maximum operating temperature of thin-film (1.2 /spl mu/m) SOI SRT sensor can reach 450/spl deg/C, much higher than 350/spl deg/C of thick-film (10 /spl mu/m) SOI SRT sensor under the same current level. With complete oxide isolation, this sensor structure can be potentially used in low power integrated sensors operating at temperatures as high as 450/spl deg/C.
Databáze: OpenAIRE