Design and simulation of large field plate lithography lens
| Autor: | Wumei Lin, Tingwen Xing, Chao Deng, Xianchang Zhu |
|---|---|
| Rok vydání: | 2016 |
| Předmět: |
Engineering
Liquid-crystal display Field (physics) Computational lithography business.industry ComputingMethodologies_IMAGEPROCESSINGANDCOMPUTERVISION Nanotechnology law.invention Lens (optics) Optics law Hardware_INTEGRATEDCIRCUITS business Lithography Maskless lithography Next-generation lithography |
| Zdroj: | SPIE Proceedings. |
| ISSN: | 0277-786X |
| DOI: | 10.1117/12.2245717 |
| Popis: | Because industry demand for LED,LCD panel continues to increase, the high yield of micron-scale resolution lithography is increasingly prominent for manufacturers, which requires the field of lithography objective lens becomes larger. This paper designed a lithography lens with large field, whose effective image side field will reach to 132 × 132mm.Subsequently, the tolerance was analysed by simulation for the optical system. Finally, it is proved that the design meets the requirements of micron-scale resolution. |
| Databáze: | OpenAIRE |
| Externí odkaz: |
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