| Autor: |
Ching-Mei Hsu, Grozdan Grozev, Hsu-Ting Huang, Tamer H. Coskun, Chris Ngai, Huixiong Dai, Mario Reybrouck, Gaetano Santoro, Vishnu Kamat |
| Rok vydání: |
2012 |
| Předmět: |
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| Zdroj: |
SPIE Proceedings. |
| ISSN: |
0277-786X |
| DOI: |
10.1117/12.918459 |
| Popis: |
In this paper we demonstrate the feasibility of Negative Tone Development (NTD) process to pattern 22nm node contact holes leveraging freeform source and model based assist features. We demonstrate this combined technology with detailed simulation and wafer results. Analysis also includes further improvement achievable using a freeform source compared to a conventional standard source while keeping the mask optimization approaches the same. Similar studies are performed using the Positive Tone Development (PTD) process to demonstrate the benefits of the NTD process. |
| Databáze: |
OpenAIRE |
| Externí odkaz: |
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