heterocyclic catalysts for enhanced silicon oxidation and wet chemical etching
Autor: | Harold G. Linde, Larry W. Austin |
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Rok vydání: | 1995 |
Předmět: |
chemistry.chemical_classification
Aqueous solution Silicon Metals and Alloys chemistry.chemical_element Condensed Matter Physics Isotropic etching Surfaces Coatings and Films Electronic Optical and Magnetic Materials Catalysis chemistry.chemical_compound Quinoxaline chemistry Heterocyclic amine Polymer chemistry Organic chemistry Amine gas treating Wet oxidation Electrical and Electronic Engineering Instrumentation |
Zdroj: | Sensors and Actuators A: Physical. 49:167-172 |
ISSN: | 0924-4247 |
Popis: | Heterocyclic amine catalysts used to accelerate the wet oxidation of 〈100〉 silicon in gallate-complexed aqueous amine etchant formulations include pyrazines, pyridazines, and N -conjugated triazoles, tetrazoles, and triazines. Faster oxidation results in faster etch rates, where 2- and 2,3-disubstituted pyrazines produce aggressive etchants. Steric factors seem to control catalytic activity: large substituents in the 2- or 2,3- positions may enhance catalyst dissociation from the oxidized silicon surface, but 2,3,5,6-substitution may inhibit association of the catalyst with the bare substrate. Etch rates greater than 125 μm h −1 are obtained on 〈100〉 Si with quinoxaline, but unconjugated 1,2-diazines or diazoles do not show catalytic activity. |
Databáze: | OpenAIRE |
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