Electron-based EUV and ultrashort hard-x-ray sources

Autor:	Andre Egbert, Bjoern Mader, Boris N. Chichkov, Boris Tkachenko
Rok vydání:	2002
Předmět:	Physics business.industry Extreme ultraviolet lithography Bremsstrahlung Laser law.invention Metrology Optics law Electron optics Femtosecond Optoelectronics business AIP Conference Proceedings Next-generation lithography
Zdroj:	AIP Conference Proceedings.
ISSN:	0094-243X
DOI:	10.1063/1.1521057
Popis:	A brief review of our progress in the realization of femtosecond laser‐driven ultrashort hard‐x‐ray sources is given. New results on the development of electron‐based compact EUV sources for “at‐wavelength” metrology and next generation lithography are presented. AIP Conference Proceedings.
Databáze:	OpenAIRE
Externí odkaz:	https://explore.openaire.eu/search/publication?articleId=doi_________::2716f29abdb30de04d4f9e7cad455759 https://doi.org/10.1063/1.1521057 Zobrazit plný text záznamu