Synthesis of Diamond Using In-Liquid Plasma Chemical Vapor Deposition
| Autor: | Shinobu Mukasa, Hiromichi Toyota, Yoshiyuki Takahashi, Shinfuku Nomura, Okuda Shinya, Toru Inoue |
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| Rok vydání: | 2009 |
| Předmět: |
Materials science
Physics and Astronomy (miscellaneous) Scanning electron microscope General Engineering Analytical chemistry General Physics and Astronomy Diamond Chemical vapor deposition Combustion chemical vapor deposition engineering.material symbols.namesake Coating Impurity engineering symbols Raman spectroscopy Plasma processing |
| Zdroj: | Japanese Journal of Applied Physics. 48:031601 |
| ISSN: | 1347-4065 0021-4922 |
| Popis: | The synthesis of diamond using in-liquid plasma chemical vapor deposition (CVD) is investigated in this study. Plasma in methanol solution is generated by applying microwave radiation of 2.45 GHz. The composition of the solution and the pressure in the container were varied as experimental parameters. No substrate cooling equipment was required in this process owing to the cooling effect of the liquid itself. The deposits on Si substrates were identified by scanning electron microscopy (SEM) and Raman spectroscopy. A diamond film containing impurities, which was confirmed to have a growth rate of 192 µm/h, was obtained. The deposit had sufficient hardness within the 15 to 80 GPa range, which is suitable for industrial hard coating. Deposition rate increased as system pressure increased, displaying the same tendency of conventional microwave CVD. Optical emission spectroscopy was used to characterize the in-liquid plasma for chemical reaction. |
| Databáze: | OpenAIRE |
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